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arXiv · 0807.4564

Metallic Pattern Fabrication in Organic Mott Insulating Crystal by Local X-Ray Irradiation

Naoki Yoneyama·Takahiko Sasaki·Norio Kobayashi·Yuka Ikemoto·Taro Moriwaki·Hiroaki Kimura
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Abstract

We have fabricated a metallic structure in an organic Mott insulator $κ$-(BEDT-TTF)$_2$Cu[N(CN)$_2$]Cl. The periodic metallic domains of approximately 90$\times$90 $μ$m$^2$ obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices.

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Naoki Yoneyama, Takahiko Sasaki, Norio Kobayashi, Yuka Ikemoto, Taro Moriwaki, Hiroaki Kimura. 2008-07-29. Metallic Pattern Fabrication in Organic Mott Insulating Crystal by Local X-Ray Irradiation. https://doi.org/10.1016/j.ssc.2009.02.034

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