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arXiv · 0808.2429

Role of vacuum fluctuation forces in thin metal film stability

Andrea Benassi·Carlo Calandra
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Abstract

Thin metal films are subject to the pressure caused by the zero point oscillations of the electromagnetic field, which depends upon the film optical properties and, in case of deposition onto a substrate, upon the substrate reflectivity. It has been suggested that this force may be relevant in determining the stability of deposited pseudomorphic films with respect to buckling or island formation. We present a detailed analysis of its behaviour as a function of the optical parameters and of the film thickness and we illustrate the conditions under which it may play some role. For free standing films it turns out that the film stabilization is basically due to the surface stress, which largely overwhelms the vacuum force. For epilayers on metal substrate the vacuum force may be important, and we give stability diagrams and critical thicknesses for several cases, illustrating how the flat surface growth may depend upon the film parameters. The importance of including retardation effects into the theory for a realistic determination of the stability conditions is also discussed.

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Andrea Benassi, Carlo Calandra. 2008-08-18. Role of vacuum fluctuation forces in thin metal film stability. https://doi.org/10.1088/1751-8113%2F41%2F17%2F175401

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