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arXiv · 0908.2733

Atom lithography without laser cooling

B. Smeets·P. van der Straten·T. Meijer·C. G. C. H. M. Fabrie·K. A. H. van Leeuwen
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Abstract

Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.

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B. Smeets, P. van der Straten, T. Meijer, C. G. C. H. M. Fabrie, K. A. H. van Leeuwen. 2009-08-19. Atom lithography without laser cooling. https://doi.org/10.1007/s00340-009-3867-3

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