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arXiv · 1002.0057

Magnetoresistance of a spin MOSFET with ferromagnetic MnAs source and drain contacts

Ryosho. Nakane·Tomoyuki Harada·Kuniaki Sugiura·Satoshi Sugahara·Masaaki Tanaka
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Abstract

Spin-dependent transport was investigated in a spin metal-oxide-semiconductor field-effect transistors (spin MOSFET) with ferromagnetic MnAs source and drain (S/D) contacts. The spin MOSFET of bottom-gate type was fabricated by photolithography using an epitaxial MnAs film grown on a silicon-on-insulator (SOI) substrate. In-plane magnetoresistance showed spin-valve-type hysteretic behavior, when the measurements were performed with constant source-drain and source-gate biases. By comparing with the magnetization-related resistance change resulting from the MnAs contacts, we conclude that the spin-polarized electrons are injected from the MnAs source into the Si MOS inversion channel, and detected by the MnAs drain.

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Ryosho. Nakane, Tomoyuki Harada, Kuniaki Sugiura, Satoshi Sugahara, Masaaki Tanaka. 2010-01-30. Magnetoresistance of a spin MOSFET with ferromagnetic MnAs source and drain contacts. https://arxiv.org/abs/1002.0057

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