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arXiv · 1008.4334

Dynamical model for the formation of patterned deposits at receding contact lines

Lubor Frastia·Andrew J. Archer·Uwe Thiele
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Abstract

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.

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Lubor Frastia, Andrew J. Archer, Uwe Thiele. 2010-08-25. Dynamical model for the formation of patterned deposits at receding contact lines. https://doi.org/10.1103/physrevlett.106.077801

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