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arXiv · 1110.2844

The critical temperature regions in resistive switching

L. Chen·P. Zhou·Q. Q. Sun·S. J. Ding·A. Q. Jiang·D. W. Zhang
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Abstract

Critical temperature regions for resistive switching were found based on HfAlO resistive switching memory. From 5 K to 300 K, the resistive switching appears at 60 K, and then a reversible bipolar switching between the two states is observed at above 150 K. It is suggested that the resistive switching characteristics of the binary transitional metal oxides are governed by thermal assisted percolating conductive paths. The process of charge trap/de-trapping under the external electrical field plays a dominated role with the assumption of the same Joule heating generated by internal conductive filament at different temperatures.

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L. Chen, P. Zhou, Q. Q. Sun, S. J. Ding, A. Q. Jiang, D. W. Zhang. 2012-08-06. The critical temperature regions in resistive switching. https://arxiv.org/abs/1110.2844

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