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arXiv · 1302.1057

Reactive-Ion-Etched Graphene Nanoribbons on a Hexagonal Boron Nitride Substrate

Dominik Bischoff·Tobias Krähenmann·Susanne Dröscher·Michelle A. Gruner·Clément Barraud·Thomas Ihn·Klaus Ensslin
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Abstract

We report on the fabrication and electrical characterization of both single layer graphene micron-sized devices and nanoribbons on a hexagonal boron nitride substrate. We show that the micron-sized devices have significantly higher mobility and lower disorder density compared to devices fabricated on silicon dioxide substrate in agreement with previous findings. The transport characteristics of the reactive-ion-etched graphene nanoribbons on hexagonal boron nitride, however, appear to be very similar to those of ribbons on a silicon dioxide substrate. We perform a detailed study in order to highlight both similarities as well as differences. Our findings suggest that the edges have an important influence on transport in reactive ion-etched graphene nanodevices.

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Dominik Bischoff, Tobias Krähenmann, Susanne Dröscher, Michelle A. Gruner, Clément Barraud, Thomas Ihn, Klaus Ensslin. 2013-02-05. Reactive-Ion-Etched Graphene Nanoribbons on a Hexagonal Boron Nitride Substrate. https://doi.org/10.1063/1.4765345

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