arXiv · 1302.2086
Ultra-high-ohmic microstripline resistors for Coulomb blockade devices
Abstract
In this paper, we report on the fabrication and the low-temperature characterization of extremely high-ohmic microstrip resistors made of a thin film of weakly oxidized titanium. Nearly linear voltage-current characteristics were measured at temperatures down to $T \sim \unit[20]{mK}$ for films with sheet resistivity up to as high as $\sim \unit[7]{kΩ}$, i.e. about an order of magnitude higher than our previous findings for weakly oxidized Cr. Our analysis indicates that such an improvement can help to create an advantageous high-impedance environment for different Coulomb blockade devices. Further properties of the Ti film addressed in this work show a promise of low-noise behavior of the resistors when applied in different realizations of the quantum standard of current.
Explore related subjects
Keep this discovery
Sergey V Lotkhov. 2013-02-08. Ultra-high-ohmic microstripline resistors for Coulomb blockade devices. https://doi.org/10.1088/0957-4484%2F24%2F23%2F235201
Cite the original work for its findings. Save a collection to share your selection of sources.