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arXiv · 1302.2660

Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

Alexander Arriola·Ainara Rodriguez·Noemi Perez·Txaber Tavera·Michael J. Withford·Alexander Fuerbach·Santiago M. Olaizola
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Abstract

Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.

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Alexander Arriola, Ainara Rodriguez, Noemi Perez, Txaber Tavera, Michael J. Withford, Alexander Fuerbach, Santiago M. Olaizola. 2013-02-11. Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors. https://doi.org/10.1364/ome.2.001571

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