arXiv · 1402.2442
Self-Aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement
Abstract
Self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllability, it encounters many challenges in physical design stages to obtain conflict-free layout decomposition. In this paper, we study the impact on placement by different standard cell layout decomposition strategies. We propose a SADP friendly standard cell configuration which provides pre-coloring results for standard cells. These configurations are brought into the placement stage to help ensure layout decomposability and save the extra effort for solving conflicts in later stages.
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Jhih-Rong Gao, Bei Yu, Ru Huang, David Z. Pan. 2014-02-11. Self-Aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement. https://doi.org/10.1117/12.2011660
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