arXiv · 1409.7639
High order model for describing the pattern formation processes on semiconductor surfaces
Abstract
The self-organization processes of nanopattern formation on semiconductor surfaces under low energy ion beam bombardment is considered. The new mathematical model based on nonlinear evolution equation of the sixth order is presented. The pseudo--spectral method for periodic boundary value problem for this equation is discussed. The influence of high order terms on the evolution of the semiconductor surface morphology is studied.
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Nikolay A. Kudryashov, Pavel N. Ryabov. 2014-09-25. High order model for describing the pattern formation processes on semiconductor surfaces. https://arxiv.org/abs/1409.7639
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