Biased doped silicene as a source for advanced electronics

Yuriy G. Pogorelov; Vadim M. Loktev

doi:10.1103/physrevb.93.045117

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arXiv · 1509.03702

Biased doped silicene as a source for advanced electronics

Yuriy G. Pogorelov·Vadim M. Loktev

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Abstract

Restructuring of electronic spectrum in a buckled silicene monolayer under some applied voltage between its two sublattices and in presence of certain impurity atoms is considered. A special attention is given to formation of localized impurity levels within the band gap and the to their collectivization at finite impurity concentration. It is shown that a qualitative restructuring of quasiparticle spectrum within the initial band gap and then specific metal-insulator phase transitions are possible for such disordered system and can be effectively controlled by variation of the electric field bias at given impurity perturbation potential and concentration. Since these effects are expected at low impurity concentrations but at not too low temperatures, they can be promising for practical applications in nanoelectronics devices.

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Yuriy G. Pogorelov, Vadim M. Loktev. 2015-09-12. Biased doped silicene as a source for advanced electronics. https://doi.org/10.1103/physrevb.93.045117

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