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arXiv · 1512.07974

Electrical properties of RF sputtered PMN-PT thin films on LCMO buffered platinized glass substrate

T. Garg·A. R. Kulkarni·N. Venkataramani
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Abstract

Lead based relaxor ferroelectric thin films have been of technological importance due to excellent properties for several commercial applications. However subtleness and high cost of fabrication have plagued of these materials. In this work a systematic study of PMN-PT thin films grown on LCMO buffered platinized glass substrates has been undertaken. The films were grown at room temperature using RF magnetron sputtering. Single phase PMN-PT films could be obtained by exsitu thermal annealing in air for 2h at temperatures 550 and 650 degree C. The films annealed at temperatures lower than 550 degree C and films without buffer layer showed presence of pyrochlore. Effect of annealing temperature on the microstructure, dielectric and ferroelectric properties of the PMN-PT films has been investigated. Scanning electron micrographs of single phase PMN-PT films show a bimodal grain size distribution for films annealed at 550 and 650 degree C. A high dielectric constant of 1300 and a remnant polarization (2Pr) of 17micro C/cm2 were observed for film annealed at 650 degree C.

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T. Garg, A. R. Kulkarni, N. Venkataramani. 2015-12-25. Electrical properties of RF sputtered PMN-PT thin films on LCMO buffered platinized glass substrate. https://arxiv.org/abs/1512.07974

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