arXiv · 1608.02511
Observation of field emission from GeSn nanoparticles epitaxially grown on silicon nanopillar arrays
Abstract
We apply molecular beam epitaxy to grow GeSn-nanoparticles on top of Si-nanopillars patterned onto p-type Si wafers. We use X-ray photoelectron spectroscopy to confirm a metallic behavior of the nanoparticle surface due to partial Sn segregation as well as the presence of a superficial Ge oxide. We report the observation of stable field emission current from the GeSn-nanoparticles. We prove that field emission can be enhanced by preventing GeSn nanoparticles oxidation or by breaking the oxide layer through electrical stress. Finally, we show that GeSn/p-Si junctions have a rectifying behavior.
Explore related subjects
Keep this discovery
Antonio Di Bartolomeo, Maurizio Passacantando, Gang Niu, Viktoria Schlykow, Grzegorz Lupina, Filippo Giubileo, Thomas Schroeder. 2016-08-08. Observation of field emission from GeSn nanoparticles epitaxially grown on silicon nanopillar arrays. https://doi.org/10.1088/0957-4484%2F27%2F48%2F485707
Cite the original work for its findings. Save a collection to share your selection of sources.