arXiv · 1801.05234
Silicon dual pillar structure with a distributed Bragg reflector for dielectric laser accelerators: Design and fabrication
Abstract
Dielectric laser accelerators (DLAs) have proven to be good candidates for miniaturized particle accelerators. They rely on micro-fabricated dielectrics which are able to modulate the kinetic energy of the incoming electron beam under a proper laser illumination. In this paper we demonstrate a dual pillar structure with a distributed Bragg reflector to mimic a double sided illumination to the electron path. The structure is fabricated by an electron beam lithography technique followed by a cryogenic reactive ion etching process. Such a structure can accelerate the injected 28 keV electrons by a gradient of approximately 150 MeV/m which can be further optimized towards the GeV/m regime.
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Peyman Yousefi, Joshua McNeur, Martin Kozák, Uwe Niedermayer, Florentina Gannott, Olga Lohse, Oliver Boine-Frankenheim, Peter Hommelhoff. 2018-10-25. Silicon dual pillar structure with a distributed Bragg reflector for dielectric laser accelerators: Design and fabrication. https://doi.org/10.1016/j.nima.2018.01.065
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