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arXiv · 1805.01183

The focusing effect of electron flow and negative refraction in three dimensional topological insulators

Wang Kai-Tong·Xing Yanxia·Cheung King Tai·Wang Jian·Pan Hui·Zhao Hong-Kang
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Abstract

We studied the focusing effect of electron flow induced by a single p-n junction (PNJ) in three-dimensional topological insulator. It is found that the electrons flowing from the n region can be focused at the symmetric position in the p region, acting as a perfect Veselago lens, regardless whether the incident energy is within or beyond the bulk energy gap. In the former case, the focusing effect occurs only in the surfaces. While in the latter case, the focusing effect occurs beyond the surfaces. These results show that the focusing effect of electron flow is a general phenomenon. It means the negative refraction may arise in all materials that are described by the massive or massless Dirac equation of 2D or beyond 2D system. Furthermore, we also find the focusing effect is robust in resisting the moderate random disorders. Finally, in the presence of a weak perpendicular magnetic field, the focusing effect remains well except that the position of the focal point is deflected by the transverse Lorentz force. Due to the finite size effect, the position of focal point oscillates periodically with a period of Delta B.

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Wang Kai-Tong, Xing Yanxia, Cheung King Tai, Wang Jian, Pan Hui, Zhao Hong-Kang. 2018-05-03. The focusing effect of electron flow and negative refraction in three dimensional topological insulators. https://doi.org/10.1088/1367-2630%2Faa8ec5

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