Low-loss Waveguide Fabrication by Inkjet Printing on Porous Silicon

Alexander Kellarev; Shlomo Ruschin

doi:10.1109/jlt.2019.2914503

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arXiv · 1812.03881

Low-loss Waveguide Fabrication by Inkjet Printing on Porous Silicon

Alexander Kellarev·Shlomo Ruschin

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Abstract

We report fabrication of optical waveguides embedded in oxidised porous silicon in a mask-less process. Patterned pore-filling was attained by means of inkjet printing, enabling lateral modification of the waveguide's index of refraction and other optical properties thus providing full two-dimensional refractive index control of the optical waveguide. The waveguides were created by applying a KDP salt solution over a porous silicon film by means of a material printer. Light guiding was demonstrated at wavelengths 1.064 and 1.550 microns. Measured values of the intensity attenuation at these wavelengths were 2.5 dB/cm and below 1.3 dB/cm respectively

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Alexander Kellarev, Shlomo Ruschin. 2019-01-15. Low-loss Waveguide Fabrication by Inkjet Printing on Porous Silicon. https://doi.org/10.1109/jlt.2019.2914503

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