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arXiv · 1903.03972

Monolayer black phosphorus by sequential wet-chemical surface oxidation

Stefan Wild·Vicent Lloret·Victor Vega-Mayoral·Daniele Vella·Edurne Nuin·Martin Siebert·Maria Koleśnik-Gray·Mario Löffler·Karl J. J. Mayrhofer·Christoph Gadermaier·Vojislav Krstić·Frank Hauke·Gonzalo Abellán·Andreas Hirsch
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Abstract

We report a straightforward chemical methodology for controlling the thickness of black phosphorus flakes down to the monolayer limit by layer-by-layer oxidation and thinning, using water as solubilizing agent. Moreover, the oxidation process can be stopped at will by two different passivation procedures, namely the non-covalent functionalization with perylene diimide chromophores, which prevents the photooxidation, or by using a protective ionic liquid layer. The obtained flakes preserve their electronic properties as demonstrated by fabricating a BP field-effect transistor (FET). This work paves the way for the preparation of BP devices with controlled thickness

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Stefan Wild, Vicent Lloret, Victor Vega-Mayoral, Daniele Vella, Edurne Nuin, Martin Siebert, Maria Koleśnik-Gray, Mario Löffler, Karl J. J. Mayrhofer, Christoph Gadermaier, Vojislav Krstić, Frank Hauke, Gonzalo Abellán, Andreas Hirsch. 2019-03-10. Monolayer black phosphorus by sequential wet-chemical surface oxidation. https://doi.org/10.1039/c8ra09069f

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