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arXiv · 2003.08930

Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

André Wählisch·Cornelia Streeck·Philipp Hönicke·Burkhard Beckhoff
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Abstract

X-ray fluorescence (XRF) analysis is a widely applied technique for the quantitative analysis of thin films up to the $\mu$m scale because of its non-destructive nature and because it is easily automated. When low uncertainties of the analytical results in the few percent range are required, the non-linear secondary fluorescence effect in multi-elemental samples may complicate an otherwise straightforward quantification, since it can easily exceed a relative contribution of 20%. The conventional solution, to rely on good performing reference samples, is hindered by their low availability, especially for thin film applications. To address this challenge, we demonstrate a flexible production method of multilayered, alloyed thin films with significant secondary fluorescence contributions. We use reference-free XRF analysis to validate the reliability of the physical model for secondary fluorescence, which includes a thorough uncertainty estimation. The investigated specimens are being qualified as calibration samples for XRF or other quantitative analyses.

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André Wählisch, Cornelia Streeck, Philipp Hönicke, Burkhard Beckhoff. 2020-03-19. Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films. https://doi.org/10.1039/d0ja00171f

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