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arXiv · 2005.14265

Two-dimensional extreme skin depth engineering for CMOS photonics

Matthew van Niekerk·Saman Jahani·Justin Bickford·Pak Cho·Stephen Anderson·Gerald Leake·Daniel Coleman·Michael L. Fanto·Christopher C. Tison·Gregory A. Howland·Zubin Jacob·Stefan F. Preble
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Abstract

Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate that e-skid can be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of large gap, bendless directional couplers with large operational bandwidth. Here we experimentally validate two-dimensional e-skid for integrated photonics in a CMOS photonics foundry and demonstrate strong coupling with a gap of 1.44 {\mu}m.

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Matthew van Niekerk, Saman Jahani, Justin Bickford, Pak Cho, Stephen Anderson, Gerald Leake, Daniel Coleman, Michael L. Fanto, Christopher C. Tison, Gregory A. Howland, Zubin Jacob, Stefan F. Preble. 2020-05-28. Two-dimensional extreme skin depth engineering for CMOS photonics. https://doi.org/10.1364/josab.416848

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