arXiv · 2006.09986
Gate-tunable non-volatile photomemory effect in MoS$_2$ transistors
Abstract
Non-volatile memory devices have been limited to flash architectures that are complex devices. Here, we present a unique photomemory effect in MoS$_2$ transistors. The photomemory is based on a photodoping effect - a controlled way of manipulating the density of free charges in monolayer MoS$_2$ using a combination of laser exposure and gate voltage application. The photodoping promotes changes on the conductance of MoS$_2$ leading to photomemory states with high memory on/off ratio. Such memory states are non-volatile with an expectation of retaining up to 50 % of the information for tens of years. Furthermore, we show that the photodoping is gate-tunable, enabling control of the recorded memory states. Finally, we propose a model to explain the photodoping, and we provide experimental evidence supporting such a phenomenon. In summary, our work includes the MoS$_2$ phototransistors in the non-volatile memory devices and expands the possibilities of memory application beyond conventional memory architectures.
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Andreij C. Gadelha, Alisson R. Cadore, Kenji Watanabe, Takashi Tanigushi, Ana M. de Paula, Leandro M. Malard, Rodrigo G. Lacerda, Leonardo C. Campos. 2020-06-17. Gate-tunable non-volatile photomemory effect in MoS$_2$ transistors. https://doi.org/10.1088/2053-1583%2Fab0af1
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