arXiv · 2010.03721
On-chip erbium-doped lithium niobate microdisk lasers
Abstract
Erbium-doped lithium niobate high-Q microdisk cavities were fabricated in batches by UV exposure, inductively coupled plasma reactive ion etching and chemo-mechanical polishing. The stimulated emission at 1531.6 nm was observed under the pump of a narrow-band laser working at 974 nm in erbium-doped lithium niobate microdisk cavity with threshold down to 400 μW and a conversion efficiency of 3.1{\times}10^{-4} %, laying the foundation for the LNOI integrated light source research.
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Qiang Luo, ZhenZhong Hao, Chen Yang, Ru Zhang, DaHuai Zheng, ShiGuo Liu, HongDe Liu, Fang Bo, YongFa Kong, GuoQuan Zhang, JingJun Xu. 2020-10-08. On-chip erbium-doped lithium niobate microdisk lasers. https://arxiv.org/abs/2010.03721
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