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arXiv · 2109.07066

Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering

Md Nizam Sayeed·Uttar Pudasaini·Charles E. Reece·Grigory V. Eremeev·Hani E. Elsayed-Ali
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Abstract

Nb3Sn films were fabricated by multilayer sequential sputtering on Nb at substrate temperatures ranging from room temperature to 250 {\deg}C. The multilayers were then annealed inside a separate vacuum furnace at 950 {\deg}C for 3h. The films material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The films superconducting properties were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature Tc. The highest film Tc was 17.76 K, obtained when the multilayers were deposited at room temperature. A superconducting Nb3Sn thin film with a smoother surface morphology but a lower Tc of 17.58 K was obtained on the film deposited at a substrate temperature of 250 {\deg}C.

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Md Nizam Sayeed, Uttar Pudasaini, Charles E. Reece, Grigory V. Eremeev, Hani E. Elsayed-Ali. 2021-09-15. Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering. https://arxiv.org/abs/2109.07066

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