arXiv · 2209.05133
Operation and Design of Ferroelectric FETs for a BEOL Compatible Device Implementation
Abstract
We present a study based on numerical simulations and comparative analysis of recent experimental data concerning the operation and design of FeFETs. Our results show that a proper consideration of charge trapping in the ferroelectric-dielectric stack is indispensable to reconcile simulations with experiments, and to attain the desired hysteretic behavior of the current-voltage characteristics. Then we analyze a few design options for polysilicon channel FeFETs and, in particular, we study the influence of the channel thickness and doping concentration on the memory window, and on the ratio between the polarization dependent, high and low resistance state.
Explore related subjects
Keep this discovery
Daniel Lizzit, David Esseni. 2022-09-12. Operation and Design of Ferroelectric FETs for a BEOL Compatible Device Implementation. https://doi.org/10.1109/essderc53440.2021.9631764
Cite the original work for its findings. Save a collection to share your selection of sources.