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arXiv · 2304.02645

Laser Etch Enabled Active Embedded Microfluidic Cooling in $\beta$-Ga$_2$O$_3$

Shonkho Shuvro·Roopa Jayaramaiah·Rangarajan Muralidharan·Digbijoy N. Nath·Prosenjit Sen
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Abstract

We demonstrate active embedded microfluidic cooling in $\beta$-Ga$_2$O$_3$. We employ a cost-effective infra-red laser etch setup to achieve controlled etching of micro-channels in 500 um thick $\beta$-Ga$_2$O$_3$ substrate. The micro-channels are about 210 um deep and 340 um wide. Resistive heating is used as proof-of-concept. At a water flow rate of 50 ml/min, a 50% reduction in surface temperature from ~140$^\circ$C to ~72$^\circ$C is achieved for 3.5 W of input power. The experimental observations are backed by thermal simulation. This work is expected to lead to a new paradigm in thermal management in emerging $\beta$-Ga$_2$O$_3$ devices.

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Shonkho Shuvro, Roopa Jayaramaiah, Rangarajan Muralidharan, Digbijoy N. Nath, Prosenjit Sen. 2023-03-18. Laser Etch Enabled Active Embedded Microfluidic Cooling in $\beta$-Ga$_2$O$_3$. https://arxiv.org/abs/2304.02645

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