arXiv · 2403.13566
Investigating model influence on the analytical resolution of neutron reflectometry
Abstract
Neutron reflectometry is a critical tool for investigating the structure of thin films and interfaces. However, the misapplication of the Born approximation to reflection geometry leads some to assume that the minimum thickness that may be probed by neutron reflectometry is limited by the Q-range of the measurement. In this study, we use model-dependent analysis, multiple isotopic contrasts, and magnetic spin states, to show that it is possible to resolve structures significantly smaller than this perceived limit. To quantify this "analytical resolution", we employ Bayesian model selection, offering a robust and quantifiable comparison between different analytical models. We believe that this work offers pivotal insights for the analysis of neutron reflectometry and hope that it will contribute to more accurate and information-rich analyses in the future.
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Nicolas Shiaelis, Luke A. Clifton, Andrew R. McCluskey. 2024-03-20. Investigating model influence on the analytical resolution of neutron reflectometry. https://arxiv.org/abs/2403.13566
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