arXiv · 2406.14959
Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers
Abstract
The intrinsic stress in nanomultilayers (NMLs) is typically dominated by interface stress, which is particularly high in immiscible Cu/W NMLs. Here, atomistic simulations with a chemically-accurate neural network potential reveal the role of interfacial intermixing and metastable phase formation on the interface stress levels. These results rationalize an experimentally-reported compressive- to-tensile transition as a function of NML deposition conditions and the extremely high interface stresses under some conditions.
Explore related subjects
Keep this discovery
Yang Hu, Giacomo Lorenzin, Jeyun Yeom, Manura Liyanage, William A. Curtin, Lars P. H. Jeurgens, Jolanta Janczak-Rusch, Claudia Cancellieri, Vladyslav Turlo. 2024-06-21. Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers. https://arxiv.org/abs/2406.14959
Cite the original work for its findings. Save a collection to share your selection of sources.