arXiv · 2409.04721
Optimal decentralized wavelength control in light sources for lithography
Abstract
Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques.
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Mruganka Kashyap. 2024-09-07. Optimal decentralized wavelength control in light sources for lithography. https://arxiv.org/abs/2409.04721
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