Searcharxiv⌕ Search
Home/Archive/arXiv

arXiv · 2410.12177

Towards Large Scale Atomic Manufacturing: Heterodyne Grating Interferometer with Zero Dead-Zone

Can Cui·Lvye Gao·Pengbo Zhao·Menghan Yang·Lifu Liu·Yu Ma·Guangyao Huang·Shengtong Wang·Linbin Luo·Xinghui Li
View original source ↗Read source document ↗Export metadata ↓

Abstract

This paper presents a novel heterodyne grating interferometer designed to meet the precise measurement requirements of next-generation lithography systems and large-scale atomic-level manufacturing. Utilizing a dual-frequency light source, the interferometer enables simultaneous measurement of three degrees of freedom. Key advancements include a compact zero Dead-Zone optical path configuration, significantly enhancing measurement reliability by mitigating the impact of light source fluctuations and air refractive index variations. A comprehensive crosstalk error analysis was conducted, resulting in a robust correction algorithm that reduces errors to below 5%. Performance testing of the prototype, size of 90mm*90mm*40mm, demonstrated exceptional resolution (0.25 nm in the XY-axis and 0.3 nm in the Z-axis), superior linearity (6.9e-5, 8.1e-5 and 16.2e-5 for the X, Y, and Z axes, respectively), high repeatability (0.8 nm/1000 nm for the three axes) and stability (20 nm for the XY-axis and 60 nm for the Z-axis over 1000 seconds). Comparative analysis with existing measurement sensors highlights the proposed method's significant advantages in integration, multidimensional capabilities, and is expected to be widely used in fields such as integrated circuits, atomic-level manufacturing and aerospace technology.

Explore related subjects

physics.opticscs.SYeess.SY

Keep this discovery

Explore connections, maps & timelines

BibTeXRIS

Can Cui, Lvye Gao, Pengbo Zhao, Menghan Yang, Lifu Liu, Yu Ma, Guangyao Huang, Shengtong Wang, Linbin Luo, Xinghui Li. 2024-10-16. Towards Large Scale Atomic Manufacturing: Heterodyne Grating Interferometer with Zero Dead-Zone. https://arxiv.org/abs/2410.12177

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

arXiv2026

Two-step high-accuracy microwave frequency measurement and time-frequency analysis based on optical frequency combs

Broadband microwave frequency measurement and time-frequency analysis are crucial for applications such as electronic warfare. However, when it comes to ultra wideband signal analysis, traditional electronic methods have high analysis accuracy, but intrinsic electronic bottlenecks limit their real-time analysis. Here, we propose and experimentally demonstrate a two-step microwave frequency measurement and time-frequency analysis method based on optical frequency combs. The system first performs coarse frequency localization over the 0-40 GHz range using stimulated-Brillouin-scattering-assisted frequency-to-time mapping (FTTM) and dual-comb channelized reception. The dual-comb is then reapplied for downconverting the signal under test, followed by digital signal processing to achieve high-accuracy unambiguous frequency extraction. Experimental results show that the system achieves mean single-tone frequency measurement errors of less than 10 kHz over 0-40 GHz. We further experimentally measure multi-tone, linearly frequency-modulated, and V-shaped frequency-modulated signals, demonstrating the proposed method's capability for analyzing complex signals.

physics.optics↗
arXiv2026

A Two-Mirror Faceted Projection System for EUV Lithography

We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of $13.5$~nm (Mo/Si) and $11.2$~nm (Ru/Be), delivering a fourfold ($4\times$) demagnification of the periodic mask pattern at a numerical aperture approaching unity ($\mathrm{NA}_{\max} \approx 0.993$). In contrast to conventional EUV projection objectives that incorporate 6--10 aspheric mirrors with an overall optical throughput of less than $15\%$, the proposed design redirects each accepted discrete spatial diffraction order scattered by the mask onto the wafer via a dedicated pair of planar mirror facets. The number of reflections is strictly fixed at two for all accepted orders, retaining $50$--$60\%$ of the power leaving the mask in each accepted order. We derive a spatial geometry providing rigorous optical path length equalization across all diffraction orders, thereby removing order-dependent propagation phase shifts. Individually optimized 30-bilayer Bragg multilayer coatings are designed for each facet using the transfer matrix method combined with global evolutionary optimization algorithms. The architecture is generalized to a three-dimensional vector formulation with a two-dimensionally periodic mask. Utilizing inverse lithography technology, Fourier parameterization, and a differentiable electromagnetic modal waveguide solver, we solve the synthesis problem for binary absorber masks (La absorber on a Ru/Be/Sr multilayer mirror). We demonstrate simulated aerial images of sub-10-nm features on the wafer (isolated peaks with a full width at half maximum (FWHM) of approximately $5.4$~nm and line pairs with a critical dimension of $6$~nm) and find that the two peaks remain resolved for the tested wafer defocus values from $0$ to $5$~nm along the $z$-axis.

physics.optics↗
arXiv2026

Antimony for broadband nanophotonics across the ultraviolet, visible and infrared

Semimetal elemental antimony (Sb) nanostructures show great potential for applications where nanophotonic properties play a key role, such as phase-change optical memories, non-linear optical elements, photothermal therapy agents, photodetectors and photocatalysts. However, designing advanced Sb-based photonic devices critically requires an accurate and reliable knowledge of the optical response of bulk and nanoscale Sb. Herein, we report for the first time a fully consistent and accurately measured dielectric function for Sb nanoscale films in a wide spectral range from the ultraviolet to the far infrared (4 - 0.04 eV, i.e. ~ 0.3 - 30 $\mu$m), surpassing previous reports that explored a limited spectral range. It is found that the Sb spectral response is driven exclusively by giant interband transitions in the visible up to mid infrared (4 - 0.4 eV, i.e. ~ 0.3 - 3 $\mu$m), and that their contribution dominates over that of free carriers down to 0.12 eV (i.e. ~ 10 $\mu$m). Such spectral response enables Sb nanostructures to display spectrally selective and tunable nanophotonic resonances. First, we showcase interband plasmonic resonances in the visible-to-near infrared for Sb nanogratings. Second, we report giant refractive index dielectric resonances in the mid infrared for nanostructured Sb/dielectric/metal resonant cavities. These findings open a pathway to optimized planar Sb nanoscale designs enabling a tailored light-matter interaction, which will be useful for integrated data, telecom, medical, optoelectronic and energy conversion devices operating in a broad spectral range.

physics.optics↗