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arXiv · 2502.12008

Enhanced magnetoelastic stress in disordered iron-gallium alloy thin films revealed by direct measurement

Abstract

The large magnetostriction in FeGa alloys is relevant for manifold applications, but for thin films, it can play a prominent role in controlling the strength of the magnetic anisotropy. Bulk samples show values depending on the extensive preparation procedure compendium, which is limited in its temperature range for high-quality thin-film synthesis. Here, we present a study of the magnetoelastic coupling coefficients $B_1$ and $B_2$ in epitaxial FeGa thin films below 50 nm deposited on the MgO(001) surface at 150 $^\circ$C by the cantilever method. Series of films with 22, 28, and 33 at. % Ga do not show thickness-dependent variations for $B_1$ and $B_2$, but $-B_1$ for the 22 at. % Ga composition is 10 MPa, roughly 2 times the bulk value and smaller than the bulk-like value of $-B_1$=12.1 MPa obtained for a film with 17 at. % Ga. This enhancement is correlated with the A2 crystal structure for the film rather than the coexistence with D0$_3$ or other ordered nanometric precipitates proposed for bulk samples. Synchrotron diffraction excludes the formation of long-range L6$_0$, or D0$_3$ precipitates in samples with (001)A2 peaks at concentrations around 25 at. % Ga, which implies partial chemical disorder. The analysis of extended x-ray absorption fine structure measurements points to a D0$_3$ local order with a residual number of Ga-Ga pairs. Considering that the substrate quenches the movable strain in the A2 phase described in dual-phase structures, our results point to the important role of the electronic structure of the iron atoms modified by the presence of Ga in the alloy. This effect enlarges $B_1$ in films with the A2 phase, stabilized using epitaxial growth.

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Adrián Begué, Maria Grazia Proietti, José Ignacio Arnaudas, Miguel Ciria. 2025-02-17. Enhanced magnetoelastic stress in disordered iron-gallium alloy thin films revealed by direct measurement. https://doi.org/10.1016/j.jallcom.2025.181326

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