Stress-driven photo-reconfiguration of surface microstructures via vectorial field-guided lithography

Abstract

Pattern formation driven by mechanical stress plays a fundamental role in shaping structural organization in both natural and human-made systems. Using light as a vectorial stimulus may offer a powerful route to control stress-induced pattern formation in materials. However, achieving localized, programmable, and predictable control of individual microstructures via structured polarization fields has remained a major challenge. Here, we introduce vectorial field-guided lithography, a novel approach that leverages fully structured polarization fields as lithographic tools to enable the stress-driven reconfiguration of pre-patterned azopolymer microstructures with an unprecedented degree of flexibility, complexity, and diversity. By building on the Viscoplastic PhotoAlignment model, which describes the azopolymer deformation as stress response to structured light, we quantitatively demonstrate and predict complex surface architectures generated by programmable light-induced stress pathways using a digital polarization rotator implemented via a spatial light modulator. We model and experimentally achieve single-step formation of anisotropic, bent, and chiral microstructures from a single pre-patterned geometry. Our results reveal an exceptional control over local microstructure morphology and establish, for the first time, a comprehensive theoretical framework capable of quantitatively designing and fabricating target morphologies on azopolymers. This work moves beyond conventional intensity-based photopatterning and demonstrates that the full vectorial nature of light can dictate the mechanical reshaping of functional polymer surfaces, providing a new platform for the programmable design of complex micro-architectures with applications in photonics, microfluidics, and biology.