SearcharxivSearch

arXiv · 2510.01064

Comparison of Gaussian process regression, partial least squares, random forest and support vector machines for a near infrared calibration of paracetamol samples

Abstract

In this article, we analyze the near-infrared (NIR) spectra of fifty-eight (58) commercial tablets of 500 mg of paracetamol from different origins (that is, with different batch numbers) in the local markets in Bamako. The NIR spectra were recorded in the spectral range 930 nm-1700 nm. The samples are divided into forty-eight (48) samples forming the set of calibration (training set) and ten (10) samples used as the validation or test set. To perform multivariate calibration, we apply-three nonlinear regression techniques (Gaussian processes regression (GPR), Random Forest (RF), Support vector machine (KSVM)), along with the traditional linear partial least-squares regression (PLSR) to several data pretreatments of the 58 samples. The results show that the three nonlinear regression calibrations have better prediction performance than PLS as far as RMSE is concerned. To decide the best regression model, we avoid R2 since this quantity is not a good parameter for this purpose. We will instead consider RMSE when comparing the different multivariate models. Additionally, to assess the impact of data preprocessing, we apply the above regression techniques to the original data, Multi-scattering correction (MSC), standard variate normalization (SNV) correction, smoothing correction, first derivative (FD), and second derivative correction (SD). The overall results reveal that Gaussian Processes Regression (GPR) applied to smooth correction gives the lowest RMSEP = 2.303053e-06 for validation (prediction) and RMSEC = 2.112316e-06 for calibration. In our investigation, one also notices that the developed GPR model is more accurate and exhibits enhanced behavior no matter which data preprocessing is used.

Explore related subjects

Keep this discovery

BibTeXRIS

Aminata Sow, Issiaka Traore, Tidiane Diallo, Mohamed Traore, Abdramane Ba. 2025-10-01. Comparison of Gaussian process regression, partial least squares, random forest and support vector machines for a near infrared calibration of paracetamol samples. https://doi.org/10.1016/j.rechem.2022.100508

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

Two-step high-accuracy microwave frequency measurement and time-frequency analysis based on optical frequency combs

Broadband microwave frequency measurement and time-frequency analysis are crucial for applications such as electronic warfare. However, when it comes to ultra wideband signal analysis, traditional electronic methods have high analysis accuracy, but intrinsic electronic bottlenecks limit their real-time analysis. Here, we propose and experimentally demonstrate a two-step microwave frequency measurement and time-frequency analysis method based on optical frequency combs. The system first performs coarse frequency localization over the 0-40 GHz range using stimulated-Brillouin-scattering-assisted frequency-to-time mapping (FTTM) and dual-comb channelized reception. The dual-comb is then reapplied for downconverting the signal under test, followed by digital signal processing to achieve high-accuracy unambiguous frequency extraction. Experimental results show that the system achieves mean single-tone frequency measurement errors of less than 10 kHz over 0-40 GHz. We further experimentally measure multi-tone, linearly frequency-modulated, and V-shaped frequency-modulated signals, demonstrating the proposed method's capability for analyzing complex signals.

physics.optics

A Two-Mirror Faceted Projection System for EUV Lithography

We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of $13.5$~nm (Mo/Si) and $11.2$~nm (Ru/Be), delivering a fourfold ($4\times$) demagnification of the periodic mask pattern at a numerical aperture approaching unity ($\mathrm{NA}_{\max} \approx 0.993$). In contrast to conventional EUV projection objectives that incorporate 6--10 aspheric mirrors with an overall optical throughput of less than $15\%$, the proposed design redirects each accepted discrete spatial diffraction order scattered by the mask onto the wafer via a dedicated pair of planar mirror facets. The number of reflections is strictly fixed at two for all accepted orders, retaining $50$--$60\%$ of the power leaving the mask in each accepted order. We derive a spatial geometry providing rigorous optical path length equalization across all diffraction orders, thereby removing order-dependent propagation phase shifts. Individually optimized 30-bilayer Bragg multilayer coatings are designed for each facet using the transfer matrix method combined with global evolutionary optimization algorithms. The architecture is generalized to a three-dimensional vector formulation with a two-dimensionally periodic mask. Utilizing inverse lithography technology, Fourier parameterization, and a differentiable electromagnetic modal waveguide solver, we solve the synthesis problem for binary absorber masks (La absorber on a Ru/Be/Sr multilayer mirror). We demonstrate simulated aerial images of sub-10-nm features on the wafer (isolated peaks with a full width at half maximum (FWHM) of approximately $5.4$~nm and line pairs with a critical dimension of $6$~nm) and find that the two peaks remain resolved for the tested wafer defocus values from $0$ to $5$~nm along the $z$-axis.

physics.optics

Antimony for broadband nanophotonics across the ultraviolet, visible and infrared

Semimetal elemental antimony (Sb) nanostructures show great potential for applications where nanophotonic properties play a key role, such as phase-change optical memories, non-linear optical elements, photothermal therapy agents, photodetectors and photocatalysts. However, designing advanced Sb-based photonic devices critically requires an accurate and reliable knowledge of the optical response of bulk and nanoscale Sb. Herein, we report for the first time a fully consistent and accurately measured dielectric function for Sb nanoscale films in a wide spectral range from the ultraviolet to the far infrared (4 - 0.04 eV, i.e. ~ 0.3 - 30 $\mu$m), surpassing previous reports that explored a limited spectral range. It is found that the Sb spectral response is driven exclusively by giant interband transitions in the visible up to mid infrared (4 - 0.4 eV, i.e. ~ 0.3 - 3 $\mu$m), and that their contribution dominates over that of free carriers down to 0.12 eV (i.e. ~ 10 $\mu$m). Such spectral response enables Sb nanostructures to display spectrally selective and tunable nanophotonic resonances. First, we showcase interband plasmonic resonances in the visible-to-near infrared for Sb nanogratings. Second, we report giant refractive index dielectric resonances in the mid infrared for nanostructured Sb/dielectric/metal resonant cavities. These findings open a pathway to optimized planar Sb nanoscale designs enabling a tailored light-matter interaction, which will be useful for integrated data, telecom, medical, optoelectronic and energy conversion devices operating in a broad spectral range.

physics.optics