arXiv · 2510.27228
High thermal conductivity of rutile-GeO$_2$ films grown by MOCVD: $52.9~\mathrm{W\,m^{-1}\,K^{-1}}$
Abstract
Rutile germanium dioxide (r-GeO2) has recently emerged as a promising ultrawide-bandgap (UWBG) semiconductor owing to its wide bandgap (~4.4-5.1 eV), ambipolar doping potential, and high theoretical thermal conductivity. However, experimental data on the thermal conductivity of r-GeO2 epitaxial layers have not been reported, primarily due to challenges in phase control and surface roughness. Here, we report a high thermal conductivity of 52.9 +/- 6.6 W m^-1 K^-1 for high-quality (002) r-GeO2 films grown by metal-organic chemical vapor deposition (MOCVD) and characterized using time-domain thermoreflectance (TDTR). The phase control was achieved through a seed-driven stepwise crystallization (SDSC) approach, and the surface roughness was significantly reduced from 76 nm to 16 nm (locally as low as 1 A) via chemical mechanical polishing (CMP). These results highlight the promise of r-GeO2 as a UWBG oxide platform for power electronics applications.
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Imteaz Rahaman, Michael E. Liao, Ziqi Wang, Eugene Y. Kwon, Rui Sun, Botong Li, Hunter D. Ellis, Bobby G. Duersch, Dali Sun, Jun Liu, Mark S. Goorsky, Michael A. Scarpulla, Kai Fu. 2025-10-31. High thermal conductivity of rutile-GeO$_2$ films grown by MOCVD: $52.9~\mathrm{W\,m^{-1}\,K^{-1}}$. https://arxiv.org/abs/2510.27228
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