Programmatically Generated Microparticles Using SUEX Dry-Film Epoxy Resist

Jason P. Beech; Jonas O. Tegenfeldt

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arXiv · 2603.18607

Programmatically Generated Microparticles Using SUEX Dry-Film Epoxy Resist

Jason P. Beech·Jonas O. Tegenfeldt

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Abstract

We present a lithographic method for fabricating free-standing microparticles directly from SUEX dry-film epoxy resist. Unlike conventional SU-8 particle fabrication, which requires patterning on solid substrates followed by sacrificial-layer release, our approach eliminates substrate use entirely and produces particles with near 100% yields. The process supports a wide design space of in-plane geometries, including high-aspect-ratio and highly complex shapes. To enable large-scale particle libraries, we integrate the method with the Nazca Python library, allowing programmatic generation of tens of thousands of parametrically defined particle designs. This combination of substrate-free fabrication and automated design provides a scalable route to custom microparticles for materials science, microfluidics, and soft-matter applications.

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BibTeX RIS

Jason P. Beech, Jonas O. Tegenfeldt. 2026-03-19. Programmatically Generated Microparticles Using SUEX Dry-Film Epoxy Resist. https://arxiv.org/abs/2603.18607

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