Nanoscopic Multiplexing Optical Data Storage via Chip Fabrication

Abstract

The accelerating growth of global data generation demands data storage platforms that offer high capacity, long lifespan, and low energy consumption beyond the limits of electronic memory technologies. Optical storage provides an attractive alternative. However, its density is fundamentally constrained by the optical diffraction limit and the limited scalability from the point-by-point laser writing, as well as thermal accumulation during high-speed writing. Here, we introduce a large-scale optical data storage scheme that is compatible with the progress in chip fabrication by combining electron-beam lithography (EBL) and ion implantation to deterministically encode high-density data. The approach achieves precise control of ion number and spatial distribution, enabling multi-bit grayscale encoding and wavelength division multiplexing with chip-scale patterning over millimeter areas. Wavelength-selective readout is performed using downconversion and upconversion fluorescence detection, allowing crosstalk-free retrieval of multiplexed data channels. We further develop a neural network-based super-resolution algorithm that reconstructs data beyond the diffraction limit, further increasing the effective storage density. Using this integrated framework, we achieve an optical data density of 10 Gbit/cm$^2$ with high fidelity. Our results establish a micro/nano-fabrication-compatible route to large-scale, high-density optical memory and provide a foundation for next-generation cold data optical storage technologies.