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arXiv · 2608.20778

Resistance Curvature: Recognition, Polyhedral Structure, and Graph Products

Meng Guo·Wensheng Sun·Yujun Yang
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Abstract

Resistance curvature, introduced by Devriendt and Lambiotte, is a novel discrete curvature notion defined through effective resistance. A graph is called resistance nonnegative if there exists a choice of positive edge weights for which the resistance curvature is nonnegative at every vertex. This property has a notable combinatorial interpretation in terms of random spanning trees: a graph is resistance nonnegative if and only if it admits a distribution on its spanning trees under which every vertex has expected degree at most two. The resistance nonnegativity can also be characterized by the tree double matching polytope. These characterizations reveal strong connections among resistance curvature, effective resistance, spanning tree distributions, matching theory, and polyhedral combinatorics. Based on the sign of the curvature, Devriendt introduced the classes of resistance nonnegative (RN), resistance positive (RP), and strictly resistance nonnegative (SRN) graphs, and posed several questions concerning their recognition, polyhedral structure, and structural properties. In this paper, we first answer Devriendt's question on the computational complexity of recognizing RN, RP, and SRN graphs by proving that all three classes can be recognized in polynomial time. We then address his question concerning the tree double matching polytope $\Theta(G)$. Further, we characterize the vertices of $\Theta(G)$ in terms of full-rank systems of tight constraints. Whenever $\Theta(G)\neq\emptyset$, we also determine the least positive integer $k_G$ such that $k_G\Theta(G)$ is a lattice polytope. Finally, for every finite Cartesian product of paths, we explicitly construct an average point satisfying the condition for resistance nonnegativity, thereby obtaining that such graphs are RN. We further characterize the classes of such Cartesian product graphs that are RP or SRN.

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Meng Guo, Wensheng Sun, Yujun Yang. 2026-08-21. Resistance Curvature: Recognition, Polyhedral Structure, and Graph Products. https://arxiv.org/abs/2608.20778

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