Hydrogen partial pressure as a key parameter in the reactive sputtering of photochromic YHO thin films

Abstract

Oxygen-containing yttrium hydride (YHO) thin films were synthesised by reactive magnetron sputtering over a wide range of hydrogen-to-argon gas flow ratios (H2/Ar) during yttrium hydride deposition, followed by post-oxidation in air. The deposition process was monitored in situ by plasma optical emission spectroscopy. X-ray diffraction reveals a strong dependence of crystallographic texture on the H2/Ar ratio: highly <100>-textured films formed at low H2/Ar ratios progressively evolve into more polycrystalline microstructures with slightly reduced crystallite size as the hydrogen content increases. The optical transmittance gradually decreases from approximately 85 % to 70 % as the H2/Ar ratio is raised to 0.6, followed by a sharp drop at higher hydrogen contents. The photochromic contrast of 690-820 nm thick YHO films, measured after 10 min of illumination with a solar simulator, decreases from 14 % to 7 % as the H2/Ar ratio increases from 0.08 to 0.60. Thinner films (360-490 nm) exhibit a similar but less pronounced trend. Bleaching kinetics, analysed using a double-exponential model, indicate faster recovery, with effective bleaching time constants of approximately 1-15 min for films deposited at H2/Ar < 0.25. X-ray photoelectron spectroscopy reveals higher oxygen incorporation in films deposited at lower H2/Ar ratios, deviating from the commonly reported correlation between oxygen content and photochromic response in YHO. These results demonstrate that low hydrogen partial pressure during reactive sputtering is advantageous for achieving higher optical transparency, enhanced photochromic contrast, and faster bleaching kinetics in YHO thin films.