Modelling sublimation and atomic layer epitaxy in the presence of competing surface reconstructions

M. Ahr; M. Biehl

doi:10.1016/s0039-6028(01)01157-8

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Modelling sublimation and atomic layer epitaxy in the presence of competing surface reconstructions

M. Ahr·M. Biehl

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Abstract

We present a solid-on-solid model of a binary AB compound, where atoms of type A in the topmost layer interact via anisotropic interactions different from those inside the bulk. Depending on temperature and particle flux, this model displays surface reconstructions similar to those of (001) surfaces of II-VI semiconductors. We show, that our model qualitatively reproduces mamy of the characteristic features of these materials which have been observed during sublimation and atomic layer epitaxy. We predict some previously unknown effects which might be observed experimentally.

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M. Ahr, M. Biehl. 2000-12-01. Modelling sublimation and atomic layer epitaxy in the presence of competing surface reconstructions. https://doi.org/10.1016/s0039-6028(01)01157-8

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