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Effect of annealing on electron dephasing in three-dimensional polycrystalline metals

J. J. Lin·Y. L. Zhong·T. J. Li
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Abstract

We have studied the effect of thermal annealing on electron dephasing times $τ_ϕ$ in three-dimensional polycrystalline metals. Measurements are performed on as-sputtered and annealed AuPd and Sb thick films, using weak-localization method. In all samples, we find that $τ_ϕ$ possesses an extremely weak temperature dependence as $T \to 0$. Our results show that the effect of annealing is non-universal, and it depends strongly on the amount of disorder quenched in the microstructures during deposition. The observed "saturation" behavior of $τ_ϕ$ cannot be easily explained by magnetic scattering. We suggest that the issue of saturation can be better addressed in three-dimensional, rather than lower-dimensional, structures.

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J. J. Lin, Y. L. Zhong, T. J. Li. 2001-12-21. Effect of annealing on electron dephasing in three-dimensional polycrystalline metals. https://doi.org/10.1209/epl%2Fi2002-00591-8

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