arXiv · cond-mat/0212563
Nanoscale self-affine surface smoothing by ion bombardment
Abstract
Topography of silicon surfaces irradiated by a 2 MeV Si$^+$ ion beam at normal incidence and ion fluences in the range $10^{15}-10^{16}$ ions/cm$^{2}$ has been investigated using scanning tunneling microscopy. At length scales below $\sim$~50 nm, surface smoothing is observed; the smoothing is more prominent at smaller length scales. The smoothed surface is self-affine with a scaling exponent $α=0.53\pm0.02$.
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D. K. Goswami, B. N. Dev. 2002-12-23. Nanoscale self-affine surface smoothing by ion bombardment. https://doi.org/10.1103/physrevb.68.033401
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