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A Numerical Study of Scaling Issues for Schottky Barrier Carbon Nanotube Transistors

Jing Guo·Supriyo Datta·Mark Lundstrom
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Abstract

We performed a comprehensive scaling study of Schottky barrier carbon nanotube transistors using self-consistent, atomistic scale simulations. We restrict our attention to Schottky barrier carbon nanotube FETs whose metal source/drain is attached to an intrinsic carbon nanotube channel. Ambipolar conduction is found to be an important factor that must be carefully considered in device design, especially when the gate oxide is thin. The channel length scaling limit imposed by source-drain tunneling is found to be between 5nm and 10nm, depending on the off-current specification. Using a large diameter tube increases the on-current, but it also increases the leakage current. Our study of gate dielectric scaling shows that the charge on the nanotube can play an important role above threshold.

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Jing Guo, Supriyo Datta, Mark Lundstrom. 2003-06-11. A Numerical Study of Scaling Issues for Schottky Barrier Carbon Nanotube Transistors. https://doi.org/10.1109/ted.2003.821883

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