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Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers

Stefan Sellner·Alexander Gerlach·Frank Schreiber·Marion Kelsch·Nikolai Kasper·Helmut Dosch·Stephan Meyer·Jens Pflaum·Matthias Fischer·Bruno Gompf
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Abstract

We show that the thermal stability of thin films of the organic semiconductor diindenoperylene (DIP) can be strongly enhanced by aluminum oxide capping layers. By thermal desorption spectroscopy and in-situ X-ray diffraction we demonstrate that organic films do not only stay on the substrate, but even remain crystalline up to 460C, i.e. 270 deg. above their desorption point for uncapped films (190C). We argue that this strong enhancement of the thermal stability compared to uncapped and also metal-capped organic layers is related to the very weak diffusion of aluminum oxide and the structurally well-defined as-grown interfaces. We discuss possible mechanisms for the eventual breakdown at high temperatures.

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Stefan Sellner, Alexander Gerlach, Frank Schreiber, Marion Kelsch, Nikolai Kasper, Helmut Dosch, Stephan Meyer, Jens Pflaum, Matthias Fischer, Bruno Gompf. 2004-07-22. Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers. https://arxiv.org/abs/cond-mat/0407588

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