Pattern formation upon femtosecond laser ablation of transparent dielectrics

Ionut Georgescu; Michael Bestehorn; Florenta Costache; Juergen Reif

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Pattern formation upon femtosecond laser ablation of transparent dielectrics

Ionut Georgescu·Michael Bestehorn·Florenta Costache·Juergen Reif

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Abstract

Costache et al. have reported recently a new type of periodic patterns generated at femtosecond laser ablation of transparent dielectrics (Appl. Surf. Sci. 186, 352(2002)). They show features known from other pattern forming systems far from equilibrium, like point and line defects or grain boundaries, and cannot be explained by the classical theory. The present work is an attempt to investigate these pattern by means of a generalized Kuramoto-Shivashinsky equation derived from the Bradley et al. and Cuerno et al. model for ripple formation at ion beam sputtering of surfaces.

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Ionut Georgescu, Michael Bestehorn, Florenta Costache, Juergen Reif. 2005-06-02. Pattern formation upon femtosecond laser ablation of transparent dielectrics. https://arxiv.org/abs/cond-mat/0411244

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