Nano-sculptured thin film thickness variation with incidence angle

Cristina Buzea; Kevin Robbie

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arXiv · cond-mat/0412256

Nano-sculptured thin film thickness variation with incidence angle

Cristina Buzea·Kevin Robbie

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Abstract

In-situ monitoring and calibration of nano-sculptured thin film thickness is a critical problem due to substrate tilt angle dependent porosity and mass flux. In this letter we present an analytical model for thickness dependence on fabrication parameters for nano-sculptured films. The generality of the model includes universal Gaussian-type flux distribution, non-unity sticking coefficients, variable off-axis sensor location, and substrate tilt. The resulting equation fits well the experimental data. The results can be particularized for films deposited at normal incidence

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Cristina Buzea, Kevin Robbie. 2004-12-09. Nano-sculptured thin film thickness variation with incidence angle. https://arxiv.org/abs/cond-mat/0412256

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