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On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity

Sebastian Vogel·Stefan J. Linz
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Abstract

Under specific experimental circumstances, sputter erosion on semiconductor materials exhibits highly ordered hexagonal dot-like nanostructures. In a recent attempt to theoretically understand this pattern forming process, Facsko et al. [Phys. Rev. B 69, 153412 (2004)] suggested a nonlocal, damped Kuramoto-Sivashinsky equation as a potential candidate for an adequate continuum model of this self-organizing process. In this study we theoretically investigate this proposal by (i) formally deriving such a nonlocal equation as minimal model from balance considerations, (ii) showing that it can be exactly mapped to a local, damped Kuramoto-Sivashinsky equation, and (iii) inspecting the consequences of the resulting non-stationary erosion dynamics.

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Sebastian Vogel, Stefan J. Linz. 2005-04-05. On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity. https://doi.org/10.1103/physrevb.72.035416

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