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Ab-initio theory of metal-insulator interfaces in a finite electric field

M. Stengel·N. A. Spaldin
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Abstract

We present a novel technique for calculating the dielectric response of metal/insulator heterostructures. This scheme allows, for the first time, the fully first-principles calculation of the microscopic properties of thin-film capacitors at finite bias potential. The method can be readily applied to pure insulators, where it provides an interesting alternative to conventional finite-field techniques based on the Berry-phase formalism. We demonstrate the effectiveness of our method by performing comprehensive numerical tests on a model Ag/MgO/Ag heterostructure.

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BibTeXRIS

M. Stengel, N. A. Spaldin. 2007-03-29. Ab-initio theory of metal-insulator interfaces in a finite electric field. https://doi.org/10.1103/physrevb.75.205121

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