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Kinetic stabilization of Fe film on GaAs(100): An in situ x-ray reflectivity Study

T. C. Kim·J. -M. Lee·Y. Kim·D. Y. Noh·S. -J. OH·J. -S. Kim
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Abstract

We study the growth of the Fe films on GaAs(100) at a low temperature, 140 K, by $in$-$situ$ UHV x-ray reflectivity using synchrotron radiation. We find rough surface with the growth exponent, $β_S$ = 0.51$\pm$0.04. This indicates that the growth of the Fe film proceeds via the restrictive relaxation due to insufficient thermal diffusion of the adatoms. The XRR curves are nicely fit by a model with a uniform Fe film, implying that the surface segregation and interface alloying of both Ga and As are negligible. When the Fe film is annealed to 300 K, however, the corresponding XRR can be fit only after including an additional layer of 9 A thickness between the Fe film and the substrate, indicating the formation of ultrathin alloy near the interface. The confinement of the alloy near the interface derives from the fact that the diffusion of Ga and As from the substrate should proceed via the inefficient bulk diffusion, and hence the overlying Fe film is kinetically stabilized.

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T. C. Kim, J. -M. Lee, Y. Kim, D. Y. Noh, S. -J. OH, J. -S. Kim. 2006-03-06. Kinetic stabilization of Fe film on GaAs(100): An in situ x-ray reflectivity Study. https://arxiv.org/abs/cond-mat/0603123

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