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Atomic and electronic structure of ultra-thin Al/AlOx/Al interfaces

M. Dieskova·M. Konopka·P. Bokes
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Abstract

Interfaces between metals based on AlO$_{x}$ represent the most popular basis for Josephson junctions or, more recently, also for junctions exhibiting substantial tunneling magneto-resistance. We have performed a computational study of possible local geometric structures of such interfaces at the ab-initio DFT/GGA level of approximation to complement recent experimental data on ultra-thin AlO$_{x}$-based interfaces. We present two competing structures that we characterise with their electronic properties: fragmentation and interface energies.

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M. Dieskova, M. Konopka, P. Bokes. 2006-08-31. Atomic and electronic structure of ultra-thin Al/AlOx/Al interfaces. https://doi.org/10.1016/j.susc.2007.04.056

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