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ECR Plasma assisted deposition of zinc nanowires

Vishwas S. Purohit·Manish Shinde·Shirshendu Dey·Renu Pasricha·C. V. Dharmadhikari·Tanay Seth·S. V. Bhoraskar
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Abstract

Deposits of one-dimensional nanostructures of zinc with diameters of 90-120 nm have been obtained by means of sputtering in an Electron Cyclotron Resonance (ECR) plasma reactor. The sputtering has been made effective by using a negatively biased cylindrical target in a hollow cathode geometry. The nanocrystalline films deposited on the glass substrate were studied with scanning tunneling microscopy/spectroscopy and was found to consist of nanowires having metallic nature. The crystalline nature of these metallic nanowires was studied with x-ray diffraction analysis.

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Vishwas S. Purohit, Manish Shinde, Shirshendu Dey, Renu Pasricha, C. V. Dharmadhikari, Tanay Seth, S. V. Bhoraskar. 2006-10-10. ECR Plasma assisted deposition of zinc nanowires. https://arxiv.org/abs/cond-mat/0610216

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