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Damping of Oscillations in Layer-by-Layer Growth

H. Kallabis·L. Brendel·J. Krug·D. E. Wolf
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Abstract

We present a theory for the damping of layer-by-layer growth oscillations in molecular beam epitaxy. The surface becomes rough on distances larger than a layer coherence length which is substantially larger than the diffusion length. The damping time can be calculated by a comparison of the competing roughening and smoothening mechanisms. The dependence on the growth conditions, temperature and deposition rate, is characterized by a power law. The theoretical results are confirmed by computer simulations.

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BibTeXRIS

H. Kallabis, L. Brendel, J. Krug, D. E. Wolf. 1997-05-12. Damping of Oscillations in Layer-by-Layer Growth. https://doi.org/10.1142/s0217979297001829

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